Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ahn Kwang-Duk | - |
| dc.contributor.author | KANG JONG HEE | - |
| dc.contributor.author | Han Dong Keun | - |
| dc.contributor.author | 김준영 | - |
| dc.contributor.author | 하성현 | - |
| dc.date.accessioned | 2024-01-13T14:32:33Z | - |
| dc.date.available | 2024-01-13T14:32:33Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/107919 | - |
| dc.language | English | - |
| dc.title | New antireflective coating materials for high resolution imaging in deep UV microlithography | - |
| dc.type | Conference | - |
| dc.description.journalClass | 2 | - |
| dc.identifier.bibliographicCitation | The Korean-Japan Joint Symposium on Imaging Materials and Technology 2001, pp.15 - 17. | - |
| dc.citation.title | The Korean-Japan Joint Symposium on Imaging Materials and Technology 2001 | - |
| dc.citation.startPage | 15 | - |
| dc.citation.endPage | 17. | - |
| dc.citation.conferencePlace | KO | - |
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