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New antireflective coating materials for high resolution imaging in deep UV microlithography

Authors

Ahn Kwang-Duk; KANG JONG HEE; Han Dong Keun; 김준영; 하성현

Citation

The Korean-Japan Joint Symposium on Imaging Materials and Technology 2001, pp.15 - 17.

URI

https://pubs.kist.re.kr/handle/201004/107919

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KIST Conference Paper > Others

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