Fabrication of noble quantum wire structures grown by low pressure MOCVD using selective area epitaxy

Authors
Kim Seong IlJewon KimPARK YOUNG KYUNKim Yong Tae
Citation
The International Conference on Electrical Engineering 2000, pp.50 - 53
Keywords
selective epitaxy; quantum wire; MOCVD; GaAs; InGaAs
URI
https://pubs.kist.re.kr/handle/201004/108299
Appears in Collections:
KIST Conference Paper > Others
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