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Effect of NH3 plasma treatment on improvement of reliability of W-B-N/HSQ thin films

Authors

김동준; 심현상; Kim Yong Tae; 박종완

Citation

The 197th Meeting of the Electrochemical Society

Keywords

low-k; W-B-N; HSQ; plasma treatment

ISSN

1091-8213

URI

https://pubs.kist.re.kr/handle/201004/108414

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KIST Conference Paper > Others

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