Single precursor MOCVD of AlN thin films & the stoichiometry controlling

Other Titles
단일전구체 MOCVD 방법을 통한 AlN 박막증착과 그 조성제어
Authors
안창규경제홍CHO SEONG HOONHAN SUNG HAN최승철Je-Hong Kyoung
Citation
2000 년도 한국재료학회 춘계 학술발표강연 및 논문개요집, pp.97
Keywords
MOCVD; single precursor; AlN
URI
https://pubs.kist.re.kr/handle/201004/108451
Appears in Collections:
KIST Conference Paper > Others
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