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A drastic change in structure and property of TiO₂ thin films deposited by metal-organic chemical vapor deposition with deposition temperature

Authors

박정훈; 홍국선; Cho Woon Jo

Citation

Material Research Society, pp.160 - 161

Keywords

TiO₂; thin film; chemical vapor deposition

URI

https://pubs.kist.re.kr/handle/201004/108559

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KIST Conference Paper > Others

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