DSpace at KIST: Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia

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DC Field	Value	Language
dc.contributor.author	심현상	-
dc.contributor.author	김동준	-
dc.contributor.author	Kim Yong Tae	-
dc.contributor.author	전형탁	-
dc.date.accessioned	2024-01-13T16:31:18Z	-
dc.date.available	2024-01-13T16:31:18Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/108905	-
dc.language	English	-
dc.subject	atomic layer deposition	-
dc.subject	tungsten nitride	-
dc.subject	cyclic CVD	-
dc.title	Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia	-
dc.type	Conference	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	제7회 한국반도체학술대회 논문집 = The 7th Korean Conference on Semiconductors, pp.481 - 482	-
dc.citation.title	제7회 한국반도체학술대회 논문집 = The 7th Korean Conference on Semiconductors	-
dc.citation.startPage	481	-
dc.citation.endPage	482	-
dc.citation.conferencePlace	KO	-

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