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Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia

Authors

심현상; 김동준; Kim Yong Tae; 전형탁

Citation

제7회 한국반도체학술대회 논문집 = The 7th Korean Conference on Semiconductors, pp.481 - 482

Keywords

atomic layer deposition; tungsten nitride; cyclic CVD

URI

https://pubs.kist.re.kr/handle/201004/108905

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KIST Conference Paper > Others

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