A study of GaN characteristics affected by stress existing in N+-implanted Si(111) substrate

Authors
고의관Park Young JuKIM EUN KYUPARK CHAN-SOO이석현이정희조성호
Citation
Proc. 7th Korean Conf. on Semiconductors = 제 7 회 한국반도체 학술대회, pp.507 - 508
Keywords
GaN
URI
https://pubs.kist.re.kr/handle/201004/108912
Appears in Collections:
KIST Conference Paper > Others
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