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dc.contributor.authorPARK CHUL WOO-
dc.contributor.authorKIM MIN CHEOL-
dc.contributor.authorKANG HO KWAN-
dc.contributor.authorMoon Sung Wook-
dc.contributor.authorOH MYUNG HWAN-
dc.contributor.author정홍배-
dc.date.accessioned2024-01-13T17:33:02Z-
dc.date.available2024-01-13T17:33:02Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/109547-
dc.languageEnglish-
dc.subject열산화법-
dc.subjectsputtering법-
dc.subject산화 바나듐-
dc.subject박막-
dc.subject특성비교-
dc.subjectsputtering-
dc.subjectoxidation-
dc.subjectTCR-
dc.titleA comparative study for the characteristics of VOx thin films fabricated by thermal oxidation and sputtering methods-
dc.title.alternative열산화법 및 sputtering법으로 제조된 산화 바나듐 박막의 특성 비교-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation센서학회지, v.10, no.1, pp.363 - 367-
dc.citation.title센서학회지-
dc.citation.volume10-
dc.citation.number1-
dc.citation.startPage363-
dc.citation.endPage367-
dc.citation.conferencePlaceKO-
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