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Characterization of thick diamond film wafer grown by multi-cathode Direct Current (DC) Plasma Assisted Chemical Vapor Deposition (PACVD)

Authors

LEE JAE KAP; Lee Wook Seong; EUN KWANG YONG; Baik Young Joon

Citation

Proc. of International Workshop on Surface Engineering and Technology, 1998, Bangalore, India, pp.7

Keywords

large area diamond deposition

URI

https://pubs.kist.re.kr/handle/201004/110067

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KIST Conference Paper > Others

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