MOCVD growth of GaN on sapphire substrate using N-atom source based on a dielectric barrier discharge method

Authors
김주성Byun DongjinKIM JIN SANGKum Dong Wha
Citation
Abst. the 9th Seoul international symposium on the physics of semiconductors and applications (ISPSA, pp.104
Keywords
MOCVD
URI
https://pubs.kist.re.kr/handle/201004/110305
Appears in Collections:
KIST Conference Paper > Others
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