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Role of restrained vertical growth in realizing one-step maskless selective epitaxy on patterned GaAs substrate

Authors

SON CHANG-SIK; PARK YOUNG KYUN; Kim Seong Il; KIM EUN KYU; 최인훈

Citation

한국물리학회 회보 = Bulletin of the Korean Physical Society, v.16, no.2, pp.476

Keywords

one-step maskless selective epitaxy; selective epitaxy; GaAs; metalorganic chemical vapor deposition

URI

https://pubs.kist.re.kr/handle/201004/110391

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KIST Conference Paper > Others

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