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dc.contributor.authorKANG JONG HEE-
dc.contributor.author신중한-
dc.contributor.author이재형-
dc.contributor.authorKim Jun Woo-
dc.contributor.authorKIM JONG MAN-
dc.contributor.authorHan Dong Keun-
dc.contributor.authorAhn Kwang-Duk-
dc.contributor.author박재근-
dc.contributor.author문성윤-
dc.contributor.author문봉석-
dc.date.accessioned2024-01-13T19:04:37Z-
dc.date.available2024-01-13T19:04:37Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/110442-
dc.languageEnglish-
dc.titleAlicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17., pp.249-
dc.citation.title한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17.-
dc.citation.startPage249-
dc.citation.endPage249-
dc.citation.conferencePlaceKO-
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