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Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists

Authors

KANG JONG HEE; 신중한; 이재형; Kim Jun Woo; KIM JONG MAN; Han Dong Keun; Ahn Kwang-Duk; 박재근; 문성윤; 문봉석

Citation

한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17., pp.249

URI

https://pubs.kist.re.kr/handle/201004/110442

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KIST Conference Paper > Others

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