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Characteristics of tungsten boron nitride thin film by plasma enhanced chemical vapor deposition

Authors

김동준; Kim Yong Tae; 박종완

Citation

Bulletin of the Korean physical society, v.15, no.1, pp.172

Keywords

W-B-N

URI

https://pubs.kist.re.kr/handle/201004/110877

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KIST Conference Paper > Others

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