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Heteroepitaxial growth of β -SiC using plasma activated methane and silane sources

Authors

김홍석; PARK YOUNG JOON; 최인훈; EUN KWANG YONG; Baik Young Joon

Citation

Abstracts of the 1st Asian-European international conference on plasma surface engineering., pp.186

Keywords

heteroepitaxial growth

URI

https://pubs.kist.re.kr/handle/201004/111237

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KIST Conference Paper > Others

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