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Characteristics of silicon oxide films prepared by chemical vapor deposition and dry oxidation method using ECR plasma sources.

Other Titles

ECR 플라즈마를 이용한 화학증착법 및 건식 산화법에 의해 제조된 실리콘 산화막의 특성

Authors

JEON BUP JU; 허정수; 윤용수; 정일현; Oh In Hwan; Lim Tae Hoon

Citation

Theories and applications of chem. res., v.2, no.1, pp.933 - ?

URI

https://pubs.kist.re.kr/handle/201004/111664

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KIST Conference Paper > Others

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