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Characteristics of a-Si:H films prepared by ECRPVD

Authors

강문상; Lim Tae Hoon; Oh In Hwan; JEON BUP JU

Citation

International electron device and materials symposia E1-3, Hsinchu, Taiwan, pp.225

URI

https://pubs.kist.re.kr/handle/201004/111701

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KIST Conference Paper > Others

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