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Characteristics of etching for Al//0//.//3Ga//0//.//7As/GaAs multilayer.

Authors

Kim Seong Il; Min Suk-Ki; MIN BYUNG DON; KIM MOO SUNG; S. K. Park; C. Lee

Citation

The 3rd Korean semiconductor conference, pp.?

Keywords

MOCVD

URI

https://pubs.kist.re.kr/handle/201004/112002

Appears in Collections:

KIST Conference Paper > Others

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