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Photoacid generating polymers from sulfonyloxymaleimides and application as dual tone resists.

Authors

Ahn Kwang-Duk; D.-I. Koo; H.-S. Cho; C.-M. Chung

Citation

Proceedings of the Tenth International Conference on Photopolymrs-Principles, Processes, and Materia, pp.86 - 95

Keywords

키워드

URI

https://pubs.kist.re.kr/handle/201004/112158

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KIST Conference Paper > Others

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