KIST Library Institutional Repository

The effects of process conditions on the prperties of SiN film in PECVD process.

Authors

Kim Yong Tae; C. W. Nam; S. I. Woo

Citation

Proc. int. meeting on chemical eng. & biotechnology: lecture programme, Frankfurt, am Main, pp.?

URI

https://pubs.kist.re.kr/handle/201004/112484

Appears in Collections:

KIST Conference Paper > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML