Equivalent oxide thickness scaling for efficient III-V/Si hybrid MOS optical phase shifter

Authors
Li, QiangHan, Jae-HoonTakenaka, MitsuruTakagi, ShinichiLee, Tsung-En
Issue Date
2019-05
Publisher
IEEE
Citation
Compound Semiconductor Week (CSW) Conference
URI
https://pubs.kist.re.kr/handle/201004/114099
Appears in Collections:
KIST Conference Paper > 2019
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