Fermi-Level Pinning-Free WSe2 Transistors via 2D Van der Waals Metal Contacts and Their Circuits

Authors
Jang, JisuRa, Hyun-SooAhn, JongtaeKim, Tae WookSong, Seung HoPark, SoohyungTaniguch, TakashiWatanabe, KenjiLee, KimoonHwang, Do Kyung
Issue Date
2022-05
Publisher
WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Citation
Advanced Materials, v.34, no.19, pp.2109899
Abstract
Precise control over the polarity of transistors is a key necessity for the construction of complementary metal-oxide-semiconductor circuits. However, the polarity control of 2D transistors remains a challenge because of the lack of a high-work-function electrode that completely eliminates Fermi-level pinning at metal-semiconductor interfaces. Here, a creation of clean van der Waals contacts is demonstrated, wherein a metallic 2D material, chlorine-doped SnSe2 (Cl-SnSe2), is used as the high-work-function contact, providing an interface that is free of defects and Fermi-level pinning. Such clean contacts made from Cl-SnSe2 can pose nearly ideal Schottky barrier heights, following the Schottky-Mott limit and thus permitting polarity-controllable transistors. With the integration of Cl-SnSe2 as contacts, WSe2 transistors exhibit pronounced p-type characteristics, which are distinctly different from those of the devices with evaporated metal contacts, where n-type transport is observed. Finally, this ability to control the polarity enables the fabrication of functional logic gates and circuits, including inverter, NAND, and NOR.
Keywords
MOS2; RESISTANCE; PERFORMANCE; TRANSITION; GRAPHENE; 2D materials; complementary metal-oxide-semiconductors; Fermi-level pinning; Schottky-Mott limit; van der Waals contacts
ISSN
0935-9648
URI
https://pubs.kist.re.kr/handle/201004/115244
DOI
10.1002/adma.202109899
Appears in Collections:
KIST Article > 2022
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