Fermi-Level Pinning-Free WSe2 Transistors via 2D Van der Waals Metal Contacts and Their Circuits
- Authors
- Jang, Jisu; Ra, Hyun-Soo; Ahn, Jongtae; Kim, Tae Wook; Song, Seung Ho; Park, Soohyung; Taniguch, Takashi; Watanabe, Kenji; Lee, Kimoon; Hwang, Do Kyung
- Issue Date
- 2022-05
- Publisher
- WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
- Citation
- Advanced Materials, v.34, no.19, pp.2109899
- Abstract
- Precise control over the polarity of transistors is a key necessity for the construction of complementary metal-oxide-semiconductor circuits. However, the polarity control of 2D transistors remains a challenge because of the lack of a high-work-function electrode that completely eliminates Fermi-level pinning at metal-semiconductor interfaces. Here, a creation of clean van der Waals contacts is demonstrated, wherein a metallic 2D material, chlorine-doped SnSe2 (Cl-SnSe2), is used as the high-work-function contact, providing an interface that is free of defects and Fermi-level pinning. Such clean contacts made from Cl-SnSe2 can pose nearly ideal Schottky barrier heights, following the Schottky-Mott limit and thus permitting polarity-controllable transistors. With the integration of Cl-SnSe2 as contacts, WSe2 transistors exhibit pronounced p-type characteristics, which are distinctly different from those of the devices with evaporated metal contacts, where n-type transport is observed. Finally, this ability to control the polarity enables the fabrication of functional logic gates and circuits, including inverter, NAND, and NOR.
- Keywords
- MOS2; RESISTANCE; PERFORMANCE; TRANSITION; GRAPHENE; 2D materials; complementary metal-oxide-semiconductors; Fermi-level pinning; Schottky-Mott limit; van der Waals contacts
- ISSN
- 0935-9648
- URI
- https://pubs.kist.re.kr/handle/201004/115244
- DOI
- 10.1002/adma.202109899
- Appears in Collections:
- KIST Article > 2022
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