Growth and Fabrication of GaAs Thin-Film Solar Cells on a Si Substrate via Hetero Epitaxial Lift-Off

Authors
Woo, S.Ryu, G.Kim, T.Hong, N.Han, J.-H.Chu, R.J.Bae, J.Kim, J.Lee, I.-H.Jung, D.Choi, W.J.
Issue Date
2022-01
Publisher
MDPI
Citation
Applied Sciences (Switzerland), v.12, no.2
Abstract
We demonstrate, for the first time, GaAs thin film solar cells epitaxially grown on a Si substrate using a metal wafer bonding and epitaxial lift-off process. A relatively thin 2.1 ?m GaAs buffer layer was first grown on Si as a virtual substrate, and a threading dislocation density of 1.8 × 107 cm?2 was achieved via two In0.1Ga0.9As strained insertion layers and 6× thermal cycle annealing. An inverted p-on-n GaAs solar cell structure grown on the GaAs/Si virtual substrate showed homogenous photoluminescence peak intensities throughout the 2” wafer. We show a 10.6% efficient GaAs thin film solar cell without anti-reflection coatings and compare it to nominally identical upright structure solar cells grown on GaAs and Si. This work paves the way for large-scale and low-cost wafer-bonded III-V multi-junction solar cells. ? 2022 by the authors. Licensee MDPI, Basel, Switzerland.
Keywords
Epitaxial lift-off; Flexible photovoltaics; Heteroepitaxial growth; Solar cell; Wafer bonding
URI
https://pubs.kist.re.kr/handle/201004/115872
DOI
10.3390/app12020820
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KIST Article > 2022
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