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dc.contributor.authorJeon, Dae-Young-
dc.contributor.authorMouis, Mireille-
dc.contributor.authorBarraud, Sylvain-
dc.contributor.authorGhibaudo, Gerard-
dc.date.accessioned2024-01-19T14:33:01Z-
dc.date.available2024-01-19T14:33:01Z-
dc.date.created2021-09-04-
dc.date.issued2021-06-
dc.identifier.issn0018-9383-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/116950-
dc.description.abstractJunctionless transistors (JLTs) have promising advantages such as structural simplicity without p-n-junctions and bulk conduction-based operation for the realization of advanced complementary metal oxide semiconductor (CMOS) technologies. Here the channel-length dependence on the operation of JLTs with substrate biasing (V-gb) was investigated in detail. Parasitic series resistance (R-sd) noticeably decreased as V-gb increased. In addition, transconductance (g(m)), its derivative (dg(m)/dV(gf)), and ON-drain current (I-ON) in a short-channel JLT were significantly affected by the V-gb-modulated R-sd with charge coupling effects. This work provides important information for better understanding and true estimation of intrinsic JLT performance, for practical applications based on polycrystalline Si, III-V semiconductors, and transition metal dichalcogenides (TMDs) nano-materials as well as advanced logic devices.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectNANOWIRE TRANSISTORS-
dc.subjectSOI-
dc.titleImpact of Channel Length on the Operation of Junctionless Transistors With Substrate Biasing-
dc.typeArticle-
dc.identifier.doi10.1109/TED.2021.3069936-
dc.description.journalClass1-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON ELECTRON DEVICES, v.68, no.6, pp.3070 - 3073-
dc.citation.titleIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.citation.volume68-
dc.citation.number6-
dc.citation.startPage3070-
dc.citation.endPage3073-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000652799800075-
dc.identifier.scopusid2-s2.0-85103908187-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusNANOWIRE TRANSISTORS-
dc.subject.keywordPlusSOI-
dc.subject.keywordAuthorTransistors-
dc.subject.keywordAuthorSubstrates-
dc.subject.keywordAuthorResistance-
dc.subject.keywordAuthorSilicon-
dc.subject.keywordAuthorLogic gates-
dc.subject.keywordAuthorTransconductance-
dc.subject.keywordAuthorCharge carriers-
dc.subject.keywordAuthorChannel-length dependence-
dc.subject.keywordAuthorelectrical parameters modulated by substrate bias-
dc.subject.keywordAuthorjunctionless transistors (JLTs)-
dc.subject.keywordAuthorseries resistance (Rsd)-
dc.subject.keywordAuthorsubstrate-biasing effect-
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