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dc.contributor.authorSo, Byeongchan-
dc.contributor.authorCheon, Changheon-
dc.contributor.authorLee, Joohyoung-
dc.contributor.authorLee, Junchae-
dc.contributor.authorKwak, Taemyung-
dc.contributor.authorChoi, Uiho-
dc.contributor.authorSong, JinDong-
dc.contributor.authorChang, Joonyeon-
dc.contributor.authorNam, Okhyun-
dc.date.accessioned2024-01-19T17:00:42Z-
dc.date.available2024-01-19T17:00:42Z-
dc.date.created2021-09-02-
dc.date.issued2020-08-31-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/118238-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectCRACK-FREE-
dc.subjectTHICK ALN-
dc.subjectSAPPHIRE-
dc.subjectFILMS-
dc.titleEpitaxial growth of deep ultraviolet light emitting diodes with two-step n-AlGaN layer-
dc.typeArticle-
dc.identifier.doi10.1016/j.tsf.2020.138103-
dc.description.journalClass1-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.708-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume708-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000541381000002-
dc.identifier.scopusid2-s2.0-85085506837-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusCRACK-FREE-
dc.subject.keywordPlusTHICK ALN-
dc.subject.keywordPlusSAPPHIRE-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthorDeep ultraviolet light emitting diodes-
dc.subject.keywordAuthorEpitaxial growth-
dc.subject.keywordAuthorHigh temperature metal organic chemical vapor deposition-
dc.subject.keywordAuthorn-Aluminum gallium nitride layer-
dc.subject.keywordAuthorTwo-step deposition-
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KIST Article > 2020
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