Deep-ultraviolet sensing characteristics of transparent and flexible IGZO thin film transistors

Authors
Yoon, JongwonBae, Ga-YoungYoo, SeonggwangYoo, Jung IlYou, Nam-HoHong, Woong-KiKo, Heung Cho
Issue Date
2020-03
Publisher
ELSEVIER SCIENCE SA
Citation
JOURNAL OF ALLOYS AND COMPOUNDS, v.817
Abstract
Recently, deep-ultraviolet (DUV) photodetectors with useful functions including transparency and flexibility have been developed for a real-time environmental monitoring, a wearable monitoring system, transparent wireless communication, and a smart window system. In this study, we investigate the DUV sensing characteristics of transparent and flexible IGZO thin-film transistors (TFTs) fabricated by a dry transfer printing, which is a very promising technique affording the device fabrication on unconventional surfaces. The fabricated TFT devices show high mechanical stability even at a bending radius of 1.4 mm, and the repeatable and gate bias-dependent DUV photoresponse characteristics. The gate bias-dependent photocurrent (I-ph) decay characteristics are likely attributed to the different surface re-adsorption rates of oxygen molecules depending on the gate bias polarity, which are qualitatively described based on energy band diagrams. In addition, the wavelength-dependent photoresponse characteristics of the IGZO TFT device upon UV illumination with lambda= 245 nm show a 10 times faster I-ph decay behavior than that upon UV illumination with lambda=365 nm. The result implies that the dissociative oxygen arising from the DUV illumination could accelerate the I-ph decay due to the increased surface adsorption. (C) 2019 Elsevier B.V. All rights reserved.
Keywords
OXIDE; DEVICE; IGZO thin film transistors; Deep-UV sensing; Transparent and flexible electronics; Transfer printing; Surface effects
ISSN
0925-8388
URI
https://pubs.kist.re.kr/handle/201004/118881
DOI
10.1016/j.jallcom.2019.152788
Appears in Collections:
KIST Article > 2020
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