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dc.contributor.authorJang, Sukjae-
dc.contributor.authorSon, Dabin-
dc.contributor.authorHwang, Sunbin-
dc.contributor.authorKang, Minji-
dc.contributor.authorLee, Seoung-Ki-
dc.contributor.authorJeon, Dae-Young-
dc.contributor.authorBae, Sukang-
dc.contributor.authorLee, Sang Hyun-
dc.contributor.authorLee, Dong Su-
dc.contributor.authorKim, Tae-Wook-
dc.date.accessioned2024-01-19T22:31:05Z-
dc.date.available2024-01-19T22:31:05Z-
dc.date.created2021-09-03-
dc.date.issued2018-07-
dc.identifier.issn2196-5404-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/121200-
dc.description.abstractLow voltage operational organic transistors (< 4 V) based on pentacene were successfully fabricated with hybrid dielectric films composed of aluminum oxide using atomic layer deposition and various phosphonic acid-based self-assembled monolayers as the gate dielectrics. High capacitances up to 279 nF/cm(2), low leakage current densities of 10(-8) A/cm(2) at 6 V, and high breakdown fields up to 7.5 MV/cm were obtained. The transistors with the octade-cylphosphonic acid hybrid dielectric exhibited an improved saturation mobility of 0.58 cm(2)/Vs, a subthreshold slope of 151 mV/decade, a threshold voltage of -1.84 V and an on-off current ratio of 10(6). The low surface energies of the self-assembled monolayers having non-polar terminal groups, such as methyl and pentafluorophenoxy, improved the carrier conduction of the transistors due to the pentacene growth with an edge-on orientation for low voltage operation. The pentafluorophenoxy end-group showed an accumulation of holes at the semiconductor-dielectric interface.-
dc.languageEnglish-
dc.publisherSpringer | Korea Nano Technology Research Society-
dc.titleHybrid dielectrics composed of Al2O3 and phosphonic acid self-assembled monolayers for performance improvement in low voltage organic field effect transistors-
dc.typeArticle-
dc.identifier.doi10.1186/s40580-018-0152-3-
dc.description.journalClass1-
dc.identifier.bibliographicCitationNano Convergence, v.5-
dc.citation.titleNano Convergence-
dc.citation.volume5-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000451705400001-
dc.identifier.scopusid2-s2.0-85065019219-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusATOMIC-LAYER-DEPOSITION-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusGATE DIELECTRICS-
dc.subject.keywordPlusLOW-TEMPERATURE-
dc.subject.keywordPlusDENSITY-
dc.subject.keywordAuthorHybrid dielectrics-
dc.subject.keywordAuthorALD Al2O3-
dc.subject.keywordAuthorPA-SAM-
dc.subject.keywordAuthorPhosphonic acid-
dc.subject.keywordAuthorWater contact angle-
dc.subject.keywordAuthorOrganic transistor-
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KIST Article > 2018
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