Hybrid dielectrics composed of Al2O3 and phosphonic acid self-assembled monolayers for performance improvement in low voltage organic field effect transistors

Authors
Jang, SukjaeSon, DabinHwang, SunbinKang, MinjiLee, Seoung-KiJeon, Dae-YoungBae, SukangLee, Sang HyunLee, Dong SuKim, Tae-Wook
Issue Date
2018-07
Publisher
Springer | Korea Nano Technology Research Society
Citation
Nano Convergence, v.5
Abstract
Low voltage operational organic transistors (< 4 V) based on pentacene were successfully fabricated with hybrid dielectric films composed of aluminum oxide using atomic layer deposition and various phosphonic acid-based self-assembled monolayers as the gate dielectrics. High capacitances up to 279 nF/cm(2), low leakage current densities of 10(-8) A/cm(2) at 6 V, and high breakdown fields up to 7.5 MV/cm were obtained. The transistors with the octade-cylphosphonic acid hybrid dielectric exhibited an improved saturation mobility of 0.58 cm(2)/Vs, a subthreshold slope of 151 mV/decade, a threshold voltage of -1.84 V and an on-off current ratio of 10(6). The low surface energies of the self-assembled monolayers having non-polar terminal groups, such as methyl and pentafluorophenoxy, improved the carrier conduction of the transistors due to the pentacene growth with an edge-on orientation for low voltage operation. The pentafluorophenoxy end-group showed an accumulation of holes at the semiconductor-dielectric interface.
Keywords
ATOMIC-LAYER-DEPOSITION; THIN-FILM TRANSISTORS; GATE DIELECTRICS; LOW-TEMPERATURE; DENSITY; Hybrid dielectrics; ALD Al2O3; PA-SAM; Phosphonic acid; Water contact angle; Organic transistor
ISSN
2196-5404
URI
https://pubs.kist.re.kr/handle/201004/121200
DOI
10.1186/s40580-018-0152-3
Appears in Collections:
KIST Article > 2018
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE