Synthesis and properties of UV curable polyvinylsilazane as a precursor for microstructuring

Abstract

Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1-bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN-based ceramic microstructures. The acrylate-modified polymers (m-PVSZ) were characterized by H-1-NMR, C-13-NMR and FT-IR methods to determine the chemical reaction mechanism. Differential photo-calorimeter and FT-IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano-imprinting method; multi-layered octagon structures were fabricated by a two-photon absorption stereolithography process. The results indicate that m-PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright (c) 2015 John Wiley & Sons, Ltd.