Nanopatterning by Laser Interference Lithography: Applications to Optical Devices

Authors
Seo, Jung-HunPark, Jung HoKim, Seong-IlPark, Bang JuMa, ZhenqiangChoi, JinnilJu, Byeong-Kwon
Issue Date
2014-02
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.14, no.2, pp.1521 - 1532
Abstract
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.
Keywords
PLASMONIC COLOR FILTERS; NANOSPHERE LITHOGRAPHY; BROAD-BAND; INTERFEROMETRIC LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; BEAM LITHOGRAPHY; PATTERNED MEDIA; FABRICATION; NANOFABRICATION; NANOSTRUCTURES; PLASMONIC COLOR FILTERS; NANOSPHERE LITHOGRAPHY; BROAD-BAND; INTERFEROMETRIC LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; BEAM LITHOGRAPHY; PATTERNED MEDIA; FABRICATION; NANOFABRICATION; NANOSTRUCTURES; Laser Interference Lithography; Optical Devices; Reflectors; Anti-Reflectors; Color Filters
ISSN
1533-4880
URI
https://pubs.kist.re.kr/handle/201004/127181
DOI
10.1166/jnn.2014.9199
Appears in Collections:
KIST Article > 2014
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