Nanopatterning by Laser Interference Lithography: Applications to Optical Devices
- Authors
- Seo, Jung-Hun; Park, Jung Ho; Kim, Seong-Il; Park, Bang Ju; Ma, Zhenqiang; Choi, Jinnil; Ju, Byeong-Kwon
- Issue Date
- 2014-02
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.14, no.2, pp.1521 - 1532
- Abstract
- A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices is provided. LIL is a patterning method. It is a simple, quick process over a large area without using a mask. LIL is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with LIL are the platform for further fabrication of nanostructures and growth of functional materials used as the building blocks for devices. Demonstration of optical and photonic devices by LIL is reviewed such as directed nanophotonics and surface plasmon resonance (SPR) or large area membrane reflectors and anti-reflectors. Perspective on future directions for LIL and emerging applications in other fields are presented.
- Keywords
- PLASMONIC COLOR FILTERS; NANOSPHERE LITHOGRAPHY; BROAD-BAND; INTERFEROMETRIC LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; BEAM LITHOGRAPHY; PATTERNED MEDIA; FABRICATION; NANOFABRICATION; NANOSTRUCTURES; PLASMONIC COLOR FILTERS; NANOSPHERE LITHOGRAPHY; BROAD-BAND; INTERFEROMETRIC LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; BEAM LITHOGRAPHY; PATTERNED MEDIA; FABRICATION; NANOFABRICATION; NANOSTRUCTURES; Laser Interference Lithography; Optical Devices; Reflectors; Anti-Reflectors; Color Filters
- ISSN
- 1533-4880
- URI
- https://pubs.kist.re.kr/handle/201004/127181
- DOI
- 10.1166/jnn.2014.9199
- Appears in Collections:
- KIST Article > 2014
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