A Study on the Scalability of a Selector Device Using Threshold Switching in Pt/GeSe/Pt

Authors
Ahn, Hyung-WooJeong, Doo SeokCheong, Byung-kiKim, Su-dongShin, Sang-YeolLim, HyungkwangKim, DonghwanLee, Suyoun
Issue Date
2013-07
Publisher
ELECTROCHEMICAL SOC INC
Citation
ECS SOLID STATE LETTERS, v.2, no.9, pp.N31 - N33
Abstract
We performed a study on the scalability of Ovonic Threshold Switching (OTS) devices using an amorphous chalcogenide material, Ge0.4Se0.6. As the cell size decreased, the maximum driving current was estimated to be over 3 x 10(7) Lambda/cm(2), surpassing the state of the art devices based on crystalline Si. However, the threshold voltage (V-TH), the holding voltage (V-H), and the holding current (I-H) were observed to increase laying challenges to be resolved for developing non-destructive and low-power consuming selector devices. V-TH was found to be reduced by decreasing the thickness of GeSe film until 40 nm, below which it started to saturate. This might be associated with the Schottky barrier formed at the interface between the amorphous semiconductor and the metal electrode. (c) 2013 The Electrochemical Society. All rights reserved.
ISSN
2162-8742
URI
https://pubs.kist.re.kr/handle/201004/127940
DOI
10.1149/2.011309ssl
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KIST Article > 2013
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