Effect of thin intermediate-layer of InAs quantum dots on the physical properties of InSb films grown on (001) GaAs

Authors
Lim, Ju YoungSong, Jin DongYang, Hae Suk
Issue Date
2012-08-31
Publisher
ELSEVIER SCIENCE SA
Citation
THIN SOLID FILMS, v.520, no.21, pp.6589 - 6594
Abstract
In this study the formation of a semiconducting InSb layer, preceded by the growth of an intermediate layer of InAs quantum dots, is attempted on (001) GaAs substrate. From the analysis of atomic-force-microscopy and transmission-electron-microscopy images together with Raman spectra of the InSb films, it is found that there exists a particular layer-thickness of similar to 0.5 mu m above which the structural and transport qualities of the film are considerably enhanced. The resultant 2.60-mu m-thick InSb layer, grown at the substrate temperature of 400 degrees C and under the Sb flux of 1.5x10(-6) Torr, shows the electron mobility as high as 67,890 cm(2)/Vs. (C) 2012 Elsevier B.V. All rights reserved.
Keywords
MOLECULAR-BEAM EPITAXY; HIGH-QUALITY INSB; SUBSTRATE; MAGNETORESISTANCE; PHOTODETECTORS; SEMICONDUCTORS; SENSORS; MOLECULAR-BEAM EPITAXY; HIGH-QUALITY INSB; SUBSTRATE; MAGNETORESISTANCE; PHOTODETECTORS; SEMICONDUCTORS; SENSORS; Defects; Interfaces; Nanostructures; Molecular beam epitaxy; InSb; Hall devices; Raman
ISSN
0040-6090
URI
https://pubs.kist.re.kr/handle/201004/128962
DOI
10.1016/j.tsf.2012.06.077
Appears in Collections:
KIST Article > 2012
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