Sequential Chemical Bath Deposition of Cu2-xSe/CdS Film by Suppressing Ion-Exchange Reaction

Authors
Cai, GangriLim, IseulLee, Deok YeonShrestha, Nabeen K.Lee, Joong KeeNah, Yoon-ChaeLee, WonjooHan, Sung-Hwan
Issue Date
2012-06-21
Publisher
AMER CHEMICAL SOC
Citation
JOURNAL OF PHYSICAL CHEMISTRY B, v.116, no.24, pp.7176 - 7180
Abstract
Chemical bath deposition is an attractive technique to form single- and multilayered metal oxide/chalcogenide films on electrode surfaces. However, the occurrence of desorption and/or ion-exchange reaction during subsequent chemical bath deposition has so far limited preparation of multilayered metal oxide/chalcogenide films. In this paper, we report a method to prevent desorption and ion-exchange reaction of metal oxide/chalcogenide on electrode surfaces using a polyelectrolyte multilayer during sequential chemical bath deposition. By controlling the ion permeability of the polyelectrolyte multilayer, Cu2-xSe film was successfully deposited on the CdS film. The Cu2-xSe/CdS film is confirmed by UV-vis absorption spectroscopy, scanning electron microscopy, energy dispersive X-ray analysis, and X-ray powder diffractometer. Furthermore, the Cu2-xSe/CdS films were investigated as photoinduced charge transfer devices which showed photocurrents of 0.22 mA/cm(2) under illumination (I = 100 mW/cm(2)).
Keywords
METAL CHALCOGENIDE; METAL CHALCOGENIDE; Chemical Bath Deposition; CuSe/CdS fiolm; Ion Exchanage; Electrode
ISSN
1520-6106
URI
https://pubs.kist.re.kr/handle/201004/129142
DOI
10.1021/jp301617q
Appears in Collections:
KIST Article > 2012
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