Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Byung-Hyun | - |
dc.contributor.author | Pamungkas, Mauludi Ariesto | - |
dc.contributor.author | Park, Mina | - |
dc.contributor.author | Kim, Gyubong | - |
dc.contributor.author | Lee, Kwang-Ryeol | - |
dc.contributor.author | Chung, Yong-Chae | - |
dc.date.accessioned | 2024-01-20T16:03:48Z | - |
dc.date.available | 2024-01-20T16:03:48Z | - |
dc.date.created | 2021-09-04 | - |
dc.date.issued | 2011-10-03 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/129899 | - |
dc.description.abstract | Using a reactive molecular dynamics simulation, the oxidation of Si nanowires (Si-NWs) with diameters of 5, 10, and 20 nm was investigated. The compressive stress at the interface between the oxide and the Si core decreased with increasing curvature in the sub-10 nm regime of the diameter, in contrast to the theory of self-limiting oxidation where rigid mechanical constraint of the Si core was assumed. The Si core of the thinner Si-NW was deformed more with surface oxidation, resulting in a lower compressive stress at the interface. These results explain the experimental observation of full oxidation of very thin Si-NWs. (C) 2011 American Institute of Physics. [doi:10,1063/1.3643038] | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | SELF-LIMITING OXIDATION | - |
dc.subject | SI NANOWIRES | - |
dc.subject | PARTICLES | - |
dc.title | Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regime | - |
dc.type | Article | - |
dc.identifier.doi | 10.1063/1.3643038 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.99, no.14 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 99 | - |
dc.citation.number | 14 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000295625100081 | - |
dc.identifier.scopusid | 2-s2.0-80053988759 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SELF-LIMITING OXIDATION | - |
dc.subject.keywordPlus | SI NANOWIRES | - |
dc.subject.keywordPlus | PARTICLES | - |
dc.subject.keywordAuthor | compressive strength | - |
dc.subject.keywordAuthor | deformation | - |
dc.subject.keywordAuthor | elemental semiconductors | - |
dc.subject.keywordAuthor | internal stresses | - |
dc.subject.keywordAuthor | molecular dynamics method | - |
dc.subject.keywordAuthor | nanowires | - |
dc.subject.keywordAuthor | oxidation | - |
dc.subject.keywordAuthor | shear modulus | - |
dc.subject.keywordAuthor | silicon | - |
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