Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Jeon, Kun-Rok | - |
dc.contributor.author | Min, Byoung-Chul | - |
dc.contributor.author | Lee, Hun-Sung | - |
dc.contributor.author | Shin, Il-Jae | - |
dc.contributor.author | Park, Chang-Yup | - |
dc.contributor.author | Shin, Sung-Chul | - |
dc.date.accessioned | 2024-01-20T19:01:52Z | - |
dc.date.available | 2024-01-20T19:01:52Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2010-07 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/131281 | - |
dc.description.abstract | We report the proper resistance-area products in the single crystalline bcc CoFe/MgO tunnel contact on nondegenerate n-Ge desirable for efficient spin injection and detection at room temperature. The electric properties of the single crystalline CoFe(5.0 nm) / MgO / n-Ge(001) tunnel contacts with an ultrathin MgO thickness of 1.5, 2.0, and 2.5 nm have been investigated by the I-V-T and C-V measurements. Interestingly, the crystalline tunnel contact with the 2.0-nm MgO exhibits the Ohmic behavior with the RA products of 5.20 X 10(-6) / 1.04 X 10(-5) Omega m(2) at +/- 0.25 V, satisfying the theoretical conditions required for significant spin injection and detection. We believe that the results are ascribed to the presence of MgO layer between CoFe and n-Ge, enhancing the Schottky pinning parameter as well as shifting the charge neutrality level. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3454276] | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Single crystalline CoFe/MgO tunnel contact on nondegenerate Ge with a proper resistance-area product for efficient spin injection and detection | - |
dc.type | Article | - |
dc.identifier.doi | 10.1063/1.3454276 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.97, no.2 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 97 | - |
dc.citation.number | 2 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000279999800030 | - |
dc.identifier.scopusid | 2-s2.0-77955148842 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | FUTURE | - |
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