InAs quantum dot superluminescent diodes with trench structure
- Authors
- Yoo, Young Chae; Kim, Lee-Hyun; Han, Il Ki
- Issue Date
- 2010-05
- Publisher
- SPRINGER
- Citation
- JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.21, no.5, pp.445 - 449
- Abstract
- Using a trench structure, we have realized improved reliability for processing InAs quantum-dot-based J-shaped superluminescent diodes (SLDs) with shallow-etched waveguides. The observed drastic decrease of output power in shallow-etched-waveguide SLDs is recovered with the deep-etched waveguide. The output power increases with decreasing separation between the waveguide and the trench. The maximum output power of the SLDs with the trench structure exceeds 25 mW. The trench structure should help to achieve low production costs while retaining high reliability.
- Keywords
- ACTIVE-REGION; 1.3-MU-M; ACTIVE-REGION; 1.3-MU-M; quantum dots; superluminescent diodes; trench structure; light sources; optical devices; semiconductors
- ISSN
- 0957-4522
- URI
- https://pubs.kist.re.kr/handle/201004/131507
- DOI
- 10.1007/s10854-009-9936-x
- Appears in Collections:
- KIST Article > 2010
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