InAs quantum dot superluminescent diodes with trench structure

Authors
Yoo, Young ChaeKim, Lee-HyunHan, Il Ki
Issue Date
2010-05
Publisher
SPRINGER
Citation
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.21, no.5, pp.445 - 449
Abstract
Using a trench structure, we have realized improved reliability for processing InAs quantum-dot-based J-shaped superluminescent diodes (SLDs) with shallow-etched waveguides. The observed drastic decrease of output power in shallow-etched-waveguide SLDs is recovered with the deep-etched waveguide. The output power increases with decreasing separation between the waveguide and the trench. The maximum output power of the SLDs with the trench structure exceeds 25 mW. The trench structure should help to achieve low production costs while retaining high reliability.
Keywords
ACTIVE-REGION; 1.3-MU-M; ACTIVE-REGION; 1.3-MU-M; quantum dots; superluminescent diodes; trench structure; light sources; optical devices; semiconductors
ISSN
0957-4522
URI
https://pubs.kist.re.kr/handle/201004/131507
DOI
10.1007/s10854-009-9936-x
Appears in Collections:
KIST Article > 2010
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