Fabrication and Characterization of an Enhancement-Mode Planar Resonant Tunneling Transistor
- Authors
- Son, SeungHun; Hwang, SungWoo; Ahn, Doyeol; Lee, JungIll; Park, YoungJu; Yu, YunSeop
- Issue Date
- 2010-01
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Citation
- IEEE TRANSACTIONS ON NANOTECHNOLOGY, v.9, no.1, pp.123 - 127
- Abstract
- We report the fabrication and characterization of a planar resonant tunneling transistor (PRTT) using a GaAs/AlGaAs heterostructure wafer. Our PRTT operates as an enhancement-mode device, and shows the negative differential resistance (NDR) modulated with the gate bias in an extremely wide range (from the fully depleted dot to the dot in a single-electron transistor regime). This NDR spectrum represents a full, gate-bias-modulated evolution of the 0-D states in a quantum dot. Our data are also consistent with the ground (E-1) and the first excited state (E-2) of the Fock-Darwin states.
- Keywords
- ELECTRONIC STATES; QUANTUM-DOT; TRANSPORT; DIODES; ELECTRONIC STATES; QUANTUM-DOT; TRANSPORT; DIODES; Enhancement mode; Fock-Darwin states; in-plane gates (IPGs); resonant tunneling
- ISSN
- 1536-125X
- URI
- https://pubs.kist.re.kr/handle/201004/131829
- DOI
- 10.1109/TNANO.2009.2018109
- Appears in Collections:
- KIST Article > 2010
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.