Fabrication and Characterization of an Enhancement-Mode Planar Resonant Tunneling Transistor

Authors
Son, SeungHunHwang, SungWooAhn, DoyeolLee, JungIllPark, YoungJuYu, YunSeop
Issue Date
2010-01
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Citation
IEEE TRANSACTIONS ON NANOTECHNOLOGY, v.9, no.1, pp.123 - 127
Abstract
We report the fabrication and characterization of a planar resonant tunneling transistor (PRTT) using a GaAs/AlGaAs heterostructure wafer. Our PRTT operates as an enhancement-mode device, and shows the negative differential resistance (NDR) modulated with the gate bias in an extremely wide range (from the fully depleted dot to the dot in a single-electron transistor regime). This NDR spectrum represents a full, gate-bias-modulated evolution of the 0-D states in a quantum dot. Our data are also consistent with the ground (E-1) and the first excited state (E-2) of the Fock-Darwin states.
Keywords
ELECTRONIC STATES; QUANTUM-DOT; TRANSPORT; DIODES; ELECTRONIC STATES; QUANTUM-DOT; TRANSPORT; DIODES; Enhancement mode; Fock-Darwin states; in-plane gates (IPGs); resonant tunneling
ISSN
1536-125X
URI
https://pubs.kist.re.kr/handle/201004/131829
DOI
10.1109/TNANO.2009.2018109
Appears in Collections:
KIST Article > 2010
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