A measurement of elastic moduli for tungsten films on polymer substrate using wrinkling analysis

Authors
Moon, Myoung-WoonHan, Jun Hyun
Issue Date
2009-11-15
Publisher
ELSEVIER SCIENCE BV
Citation
APPLIED SURFACE SCIENCE, v.256, no.3, pp.593 - 596
Abstract
The elastic moduli of ultra thin tungsten (W) films on polymers were assessed with wrinkling analysis. Thin W films with a range of thickness between 17 and 100 nm were deposited on compliant polymers and Si strips using DC magnetron sputtering method, causing the tensile stress in a few GPa scale with respect to the thickness of W films. By applying lateral compression on polymer, wrinkle patterns were developed in the W thin film with well-defined amplitude and wavelength. Using a simple equation on wrinkle analysis, the range of elastic moduli was estimated with increasing the thickness. It was found that the elastic modulus and the tensile stress decreased with increasing the film thickness. (c) 2009 Published by Elsevier B.V.
Keywords
BUCKLING-BASED METROLOGY; COMPRESSED THIN-FILMS; FOCUSED ION-BEAM; RESIDUAL-STRESS; MICROSTRUCTURE; ADHESION; PATTERNS; BUCKLING-BASED METROLOGY; COMPRESSED THIN-FILMS; FOCUSED ION-BEAM; RESIDUAL-STRESS; MICROSTRUCTURE; ADHESION; PATTERNS; Wrinkling; Tungsten; Microstructure; DC magnetron sputtering
ISSN
0169-4332
URI
https://pubs.kist.re.kr/handle/201004/131959
DOI
10.1016/j.apsusc.2009.04.186
Appears in Collections:
KIST Article > 2009
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