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dc.contributor.author이재상-
dc.contributor.author구상모-
dc.contributor.author이상렬-
dc.date.accessioned2024-01-20T20:35:09Z-
dc.date.available2024-01-20T20:35:09Z-
dc.date.created2021-09-06-
dc.date.issued2009-09-
dc.identifier.issn1226-7945-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/132181-
dc.description.abstractThe TFTs have been fabricated with 3 different geometry S/D electrodes which have the same channel W/L ratio (W/L = 5) due to constant channel resistance, The 3 samples have different channel widths (350, 150, and 25 μm) and channel lengths (70, 30, and 5 μm) by fixed channel W/L ratio simultaneously on one chip for reliable comparisons. Resultant on-current and field effect mobility are proportional to the channel width, while the subthreshold swing is inversely proportional to the channel width mainly due to the change of contact resistance. These results show that the contact resistance strongly affects the device performances and should be considered in the applications.-
dc.languageKorean-
dc.publisher한국전기전자재료학회-
dc.title산화물 박막 트랜지스터 동작에 대한 접촉 저항의 영향-
dc.title.alternativeStudy on Contact Resistance on the Performance of Oxide Thin Film Transistors-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation전기전자재료학회논문지, v.22, no.9, pp.747 - 750-
dc.citation.title전기전자재료학회논문지-
dc.citation.volume22-
dc.citation.number9-
dc.citation.startPage747-
dc.citation.endPage750-
dc.description.journalRegisteredClasskci-
dc.identifier.kciidART001372557-
dc.subject.keywordAuthorZrO2-
dc.subject.keywordAuthora-IGZO-
dc.subject.keywordAuthorThin film transistor-
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KIST Article > 2009
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