산화물 박막 트랜지스터 동작에 대한 접촉 저항의 영향

Other Titles
Study on Contact Resistance on the Performance of Oxide Thin Film Transistors
Authors
이재상구상모이상렬
Issue Date
2009-09
Publisher
한국전기전자재료학회
Citation
전기전자재료학회논문지, v.22, no.9, pp.747 - 750
Abstract
The TFTs have been fabricated with 3 different geometry S/D electrodes which have the same channel W/L ratio (W/L = 5) due to constant channel resistance, The 3 samples have different channel widths (350, 150, and 25 μm) and channel lengths (70, 30, and 5 μm) by fixed channel W/L ratio simultaneously on one chip for reliable comparisons. Resultant on-current and field effect mobility are proportional to the channel width, while the subthreshold swing is inversely proportional to the channel width mainly due to the change of contact resistance. These results show that the contact resistance strongly affects the device performances and should be considered in the applications.
Keywords
ZrO2; a-IGZO; Thin film transistor
ISSN
1226-7945
URI
https://pubs.kist.re.kr/handle/201004/132181
Appears in Collections:
KIST Article > 2009
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