Dielectric response of AlSb from 0.7 to 5.0 eV determined by in situ ellipsometry
- Authors
 - Jung, Y. W.; Ghong, T. H.; Byun, J. S.; Kim, Y. D.; Kim, H. J.; Chang, Y. C.; Shin, S. H.; Song, J. D.
 
- Issue Date
 - 2009-06-08
 
- Publisher
 - AMER INST PHYSICS
 
- Citation
 - APPLIED PHYSICS LETTERS, v.94, no.23
 
- Abstract
 - We present pseudodielectric function data <<epsilon >>=<<epsilon(1)>>+i <<epsilon(2)>> from 0.7 to 5.0 eV of oxide-free AlSb that are the closest representation to date of the intrinsic bulk dielectric response epsilon of the material. Measurements were done on a 1.5 mu m thick film grown on (001) GaAs by molecular beam epitaxy. Data were obtained with the film in situ to avoid oxidation artifacts. Overlapping critical-point (CP) structures in the E-2 energy region were identified by means of band-structure calculations done with the linear augmented Slater-type orbital method. Calculated CP energies agree well with those obtained from data, confirming the validity of the calculations.
 
- Keywords
 - SPECTROSCOPIC ELLIPSOMETRY; COMPOUND SEMICONDUCTORS; ANTIMONIDE; ALAS; SPECTROSCOPIC ELLIPSOMETRY; COMPOUND SEMICONDUCTORS; ANTIMONIDE; ALAS; aluminium compounds; critical points; dielectric function; ellipsometry; III-V semiconductors; molecular beam epitaxial growth; semiconductor thin films; STO calculations
 
- ISSN
 - 0003-6951
 
- URI
 - https://pubs.kist.re.kr/handle/201004/132398
 
- DOI
 - 10.1063/1.3153127
 
- Appears in Collections:
 - KIST Article > 2009
 
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