Dielectric response of AlSb from 0.7 to 5.0 eV determined by in situ ellipsometry

Authors
Jung, Y. W.Ghong, T. H.Byun, J. S.Kim, Y. D.Kim, H. J.Chang, Y. C.Shin, S. H.Song, J. D.
Issue Date
2009-06-08
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.94, no.23
Abstract
We present pseudodielectric function data <<epsilon >>=<<epsilon(1)>>+i <<epsilon(2)>> from 0.7 to 5.0 eV of oxide-free AlSb that are the closest representation to date of the intrinsic bulk dielectric response epsilon of the material. Measurements were done on a 1.5 mu m thick film grown on (001) GaAs by molecular beam epitaxy. Data were obtained with the film in situ to avoid oxidation artifacts. Overlapping critical-point (CP) structures in the E-2 energy region were identified by means of band-structure calculations done with the linear augmented Slater-type orbital method. Calculated CP energies agree well with those obtained from data, confirming the validity of the calculations.
Keywords
SPECTROSCOPIC ELLIPSOMETRY; COMPOUND SEMICONDUCTORS; ANTIMONIDE; ALAS; SPECTROSCOPIC ELLIPSOMETRY; COMPOUND SEMICONDUCTORS; ANTIMONIDE; ALAS; aluminium compounds; critical points; dielectric function; ellipsometry; III-V semiconductors; molecular beam epitaxial growth; semiconductor thin films; STO calculations
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/132398
DOI
10.1063/1.3153127
Appears in Collections:
KIST Article > 2009
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