Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shin, J. W. | - |
dc.contributor.author | Lee, J. Y. | - |
dc.contributor.author | No, Y. S. | - |
dc.contributor.author | Kim, T. W. | - |
dc.contributor.author | Choi, W. K. | - |
dc.date.accessioned | 2024-01-20T21:30:24Z | - |
dc.date.available | 2024-01-20T21:30:24Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2009-06 | - |
dc.identifier.issn | 0884-2914 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/132451 | - |
dc.description.abstract | High-resolution transmission electron microscopy (HRTEM) images of annealed ZnO thin-films showed the domain boundaries of a (01 (1) over bar0) plane with a transition zone and a (01 (1) over bar1) plane without a transition zone. The 30 degrees in-plane rotation domain boundaries were formed in the ZnO thin films because the angle of the c-axis was tilted 3.5 degrees in comparison with that of neighboring 30 degrees in-plane rotation domains to reduce the misfit strain energy. The atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing are described. | - |
dc.language | English | - |
dc.publisher | CAMBRIDGE UNIV PRESS | - |
dc.subject | ELECTRONIC-STRUCTURE | - |
dc.subject | SAPPHIRE | - |
dc.subject | EPITAXY | - |
dc.title | Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing | - |
dc.type | Article | - |
dc.identifier.doi | 10.1557/JMR.2009.0233 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF MATERIALS RESEARCH, v.24, no.6, pp.2006 - 2010 | - |
dc.citation.title | JOURNAL OF MATERIALS RESEARCH | - |
dc.citation.volume | 24 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 2006 | - |
dc.citation.endPage | 2010 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000267207900015 | - |
dc.identifier.scopusid | 2-s2.0-68149126734 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ELECTRONIC-STRUCTURE | - |
dc.subject.keywordPlus | SAPPHIRE | - |
dc.subject.keywordPlus | EPITAXY | - |
dc.subject.keywordAuthor | domain boundary | - |
dc.subject.keywordAuthor | ZnO | - |
dc.subject.keywordAuthor | Si | - |
dc.subject.keywordAuthor | thermal annealing | - |
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