Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing

Authors
Shin, J. W.Lee, J. Y.No, Y. S.Kim, T. W.Choi, W. K.
Issue Date
2009-06
Publisher
CAMBRIDGE UNIV PRESS
Citation
JOURNAL OF MATERIALS RESEARCH, v.24, no.6, pp.2006 - 2010
Abstract
High-resolution transmission electron microscopy (HRTEM) images of annealed ZnO thin-films showed the domain boundaries of a (01 (1) over bar0) plane with a transition zone and a (01 (1) over bar1) plane without a transition zone. The 30 degrees in-plane rotation domain boundaries were formed in the ZnO thin films because the angle of the c-axis was tilted 3.5 degrees in comparison with that of neighboring 30 degrees in-plane rotation domains to reduce the misfit strain energy. The atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing are described.
Keywords
ELECTRONIC-STRUCTURE; SAPPHIRE; EPITAXY; ELECTRONIC-STRUCTURE; SAPPHIRE; EPITAXY; domain boundary; ZnO; Si; thermal annealing
ISSN
0884-2914
URI
https://pubs.kist.re.kr/handle/201004/132451
DOI
10.1557/JMR.2009.0233
Appears in Collections:
KIST Article > 2009
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