Low-voltage ultraviolet detectors using ZnO thin-film transistor isolated by B ion implantation

Authors
Bae, HeesunIm, SeongilSong, Jonghan
Issue Date
2008-07
Publisher
IOP PUBLISHING LTD
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.7, pp.5362 - 5364
Abstract
We report on the fabrication of a photo-detector and a photo-inverter adopting ZnO thin-film transistors (TFTs) that have been electrically isolated by implanting B ions onto peripheral ZnO area around active ZnO channel. Our isolated ZnO-TFT exhibited a fine mobility of 0.8cm(2)/(V.s) and on/off current ratio of similar to 10(4). Since the device also showed quite a high threshold voltage of 21 V, it was effective to be a photo-detector under a zero gate bias. When our photo-devices were composed of a ZnO-TFT and a 100M Omega resistor, a minimum response time of similar to 5 ms under 364nm ultraviolet light was achieved, thereby dynamically showing photo-inverting and detecting behaviors.
Keywords
ZnO; isolation technology; ion implantation; thin-film transistors; photodetectors
ISSN
0021-4922
URI
https://pubs.kist.re.kr/handle/201004/133357
DOI
10.1143/JJAP.47.5362
Appears in Collections:
KIST Article > 2008
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