Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kumar, P. | - |
dc.contributor.author | Kumar, Ravi | - |
dc.contributor.author | Kanjilal, D. | - |
dc.contributor.author | Knobel, M. | - |
dc.contributor.author | Thakur, P. | - |
dc.contributor.author | Chae, K. H. | - |
dc.date.accessioned | 2024-01-20T23:03:11Z | - |
dc.date.available | 2024-01-20T23:03:11Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2008-07 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/133366 | - |
dc.description.abstract | Fabrication and fluence dependent growth of Ni nanoparticles in quartz matrix using a low energy ion implantation followed by thermal annealing are reported. 100 keV Ni ions are implanted (at room temperature) in quartz at different ion fluences using a low energy ion beam facility. The samples are postannealed at 600 degrees C and then characterized using atomic force microscopy, magnetic force microscopy, field cooled and zero field cooled magnetization measurements, x-ray absorption spectroscopy, and UV-visible spectroscopy. Nanoclusters of Ni of nearly uniform size are synthesized at an ion fluence of 5x10(16) ions/cm(2). The size of these nanoclusters could be varied by varying ion fluence. Formation of NiO nanoclusters is observed for ion fluence of 2x10(17) ions/cm(2). (c) 2008 American Vacuum Society. | - |
dc.language | English | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.subject | SILICA GLASS | - |
dc.subject | NANOCLUSTERS | - |
dc.subject | IMPLANTATION | - |
dc.subject | PARTICLES | - |
dc.title | Ion beam synthesis of Ni nanoparticles embedded in quartz | - |
dc.type | Article | - |
dc.identifier.doi | 10.1116/1.2956624 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.26, no.4, pp.L36 - L40 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.volume | 26 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | L36 | - |
dc.citation.endPage | L40 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000258494400002 | - |
dc.identifier.scopusid | 2-s2.0-49749097959 | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Letter | - |
dc.subject.keywordPlus | SILICA GLASS | - |
dc.subject.keywordPlus | NANOCLUSTERS | - |
dc.subject.keywordPlus | IMPLANTATION | - |
dc.subject.keywordPlus | PARTICLES | - |
dc.subject.keywordAuthor | nanoparticle | - |
dc.subject.keywordAuthor | ion implantation | - |
dc.subject.keywordAuthor | x-ray absorption spectroscopy | - |
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