Ion beam synthesis of Ni nanoparticles embedded in quartz

Authors
Kumar, P.Kumar, RaviKanjilal, D.Knobel, M.Thakur, P.Chae, K. H.
Issue Date
2008-07
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.26, no.4, pp.L36 - L40
Abstract
Fabrication and fluence dependent growth of Ni nanoparticles in quartz matrix using a low energy ion implantation followed by thermal annealing are reported. 100 keV Ni ions are implanted (at room temperature) in quartz at different ion fluences using a low energy ion beam facility. The samples are postannealed at 600 degrees C and then characterized using atomic force microscopy, magnetic force microscopy, field cooled and zero field cooled magnetization measurements, x-ray absorption spectroscopy, and UV-visible spectroscopy. Nanoclusters of Ni of nearly uniform size are synthesized at an ion fluence of 5x10(16) ions/cm(2). The size of these nanoclusters could be varied by varying ion fluence. Formation of NiO nanoclusters is observed for ion fluence of 2x10(17) ions/cm(2). (c) 2008 American Vacuum Society.
Keywords
SILICA GLASS; NANOCLUSTERS; IMPLANTATION; PARTICLES; SILICA GLASS; NANOCLUSTERS; IMPLANTATION; PARTICLES; nanoparticle; ion implantation; x-ray absorption spectroscopy
ISSN
1071-1023
URI
https://pubs.kist.re.kr/handle/201004/133366
DOI
10.1116/1.2956624
Appears in Collections:
KIST Article > 2008
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