Large spin diffusion length in an amorphous organic semiconductor

Authors
Shim, J. H.Raman, K. V.Park, Y. J.Santos, T. S.Miao, G. X.Satpati, B.Moodera, J. S.
Issue Date
2008-06-06
Publisher
AMER PHYSICAL SOC
Citation
PHYSICAL REVIEW LETTERS, v.100, no.22
Abstract
We directly measured a spin diffusion length (lambda(s)) of 13.3 nm in amorphous organic semiconductor (OS) rubrene (C42H28) by spin polarized tunneling. In comparison, no spin-conserved transport has been reported in amorphous Si or Ge. Absence of dangling bond defects can explain the spin transport behavior in amorphous OS. Furthermore, when rubrene barriers were grown on a seed layer, the elastic tunneling characteristics were greatly enhanced. Based on our findings, lambda(s) in single-crystalline rubrene can be expected to reach even millimeters, showing the potential for organic spintronics development.
Keywords
MAGNETORESISTANCE; STATES; METAL; MAGNETORESISTANCE; STATES; METAL; organic semiconductor; spin diffusion length; rubrene barrier; organic spintronics; magnetic tunnel junctions
ISSN
0031-9007
URI
https://pubs.kist.re.kr/handle/201004/133397
DOI
10.1103/PhysRevLett.100.226603
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KIST Article > 2008
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