Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects
- Authors
- Cho, Sung Ki; Lee, Jong Kyun; Kim, Soo-Kil; Kim, Jae Jeong
- Issue Date
- 2007-10
- Publisher
- ELECTROCHEMICAL SOC INC
- Citation
- ELECTROCHEMICAL AND SOLID STATE LETTERS, v.10, no.10, pp.D116 - D119
- Abstract
- The addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the high-order complexation of Cu with the free CN- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag (CN)(2)(-) compared to Ag (CN)(3)(2-). Because Ag (CN)(2)(-) could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag (CN)(2)(-) peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. (C) 2007 The Electrochemical Society.
- Keywords
- SUPERCONFORMAL ELECTRODEPOSITION; ELECTROMIGRATION RESISTANCE; COPPER; SILVER; METALLIZATION; SYSTEM; FILM; SUPERCONFORMAL ELECTRODEPOSITION; ELECTROMIGRATION RESISTANCE; COPPER; SILVER; METALLIZATION; SYSTEM; FILM; Ag; Electrodeposition; CuCN; Interconnect
- ISSN
- 1099-0062
- URI
- https://pubs.kist.re.kr/handle/201004/134058
- DOI
- 10.1149/1.2769103
- Appears in Collections:
- KIST Article > 2007
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