Acceleration effect of CuCN in Ag electroplating for ultralarge-scale interconnects

Authors
Cho, Sung KiLee, Jong KyunKim, Soo-KilKim, Jae Jeong
Issue Date
2007-10
Publisher
ELECTROCHEMICAL SOC INC
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, v.10, no.10, pp.D116 - D119
Abstract
The addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the high-order complexation of Cu with the free CN- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag (CN)(2)(-) compared to Ag (CN)(3)(2-). Because Ag (CN)(2)(-) could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag (CN)(2)(-) peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. (C) 2007 The Electrochemical Society.
Keywords
SUPERCONFORMAL ELECTRODEPOSITION; ELECTROMIGRATION RESISTANCE; COPPER; SILVER; METALLIZATION; SYSTEM; FILM; SUPERCONFORMAL ELECTRODEPOSITION; ELECTROMIGRATION RESISTANCE; COPPER; SILVER; METALLIZATION; SYSTEM; FILM; Ag; Electrodeposition; CuCN; Interconnect
ISSN
1099-0062
URI
https://pubs.kist.re.kr/handle/201004/134058
DOI
10.1149/1.2769103
Appears in Collections:
KIST Article > 2007
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